Nanoimprint Lithography Fabrication
and Mass Production
Nanoimprint lithography has been increasingly adopted by the industry for manufacturing next-generation displays, LEDs, sensors, etc. As a mechanical replication process, nanoimprint possesses the highest replication resolution and patterning fidelity at the single-digit nanometer level and can be applied on large and non-planar substrates at high throughput. InterLitho team’s profound experience in nanoimprint master fabrication and process development will be helping our customers to manufacture nanoimprint-fabricated products at the best quality.
Thermal and UV-curable Nanoimprint
Nanoimprint lithography is a mechanical patterning method for replicating nanoscale patterns. This method involves the mechanical deformation and curing of an imprinted resist to form a pattern. The imprinted resist is typically a properly-designed monomer or polymer formulation with thermoplastic or UV-curable properties that is cured by heat or UV light during the imprinting process. This method also allows direct embossing of thermoplastic substrate materials.
Nanoimprint is a low-cost, high-yield, and high-resolution nanopatterning process especially useful for mass production of many emerging consumer electronic and optical devices. Nanoimprint also holds great potential for fundamental scientific research in materials and devices.
One important advantage of nanoimprint lithography is its capability of replicating high-resolution patterns down to the single-digit-nanometer scale, exceeding the most advanced extreme ultraviolet (EUV) lithography. As a mechanical patterning process, nanoimprint lithography also offers high patterning fidelity at the nanometer scale. Nanoimprint lithography is now listed as one of the candidate patterning technologies for future nodes on the semiconductor roadmap for integrated circuit manufacturing.
Our team has a long track record of nanoimprint work at the highest resolution. Our profound expertise and knowledge in nanoimprint materials, processes, and particularly in master fabrication has enabled the replication of 4-nm-half-pitch dense line patterns using nanoimprint, which is still among the highest demonstrated patterning resolution on artificially designed patterns.
Master Mold Fabrication
Master molds are the key component of the nanoimprinting process. Master molds typically contain high-quality nanopatterns fabricated on silicon or silica substrates using interference lithography, electron beam lithography, or direct laser writing, together with many other fabrication processes such as deposition and etching. With profound nanofabrication experience accumulated for decades, we have a long track record of fabricating large-area, high-quality master molds for nanoimprinting. Our master molds have been provided to various customers including academic researchers and industrial companies for developing versatile devices, such as AR devices, biomedical sensors, metasurfaces, etc.
Polymeric Working Template
Polymeric Working Templates are usually UV-cured epoxy on polymeric substrates, with nanostructures replicated from the master templates. The use of working templates in the process can reduce the deterioration of master templates. InterLitho uses both commercial and proprietary UV-cured epoxy to fabricate high-quality working templates according to customers’ needs at an affordable cost.
Nanoimprint Mass Production
More and more emerging products employing deterministic nanostructures, such as AR glasses, DOEs, PSS/nPSS, etc., nanoimprinting has been attracting attentions as a cost-effective, high-throughput, high-resolution, scalable mass production method. Processing techniques, equipment, molds, and material selection are all critical to mass production using nanoimprint. With extensive experience in nanoimprint for both academic and industrial applications, we help our customers to develop high-quality nanoimprint-based mass production solutions, and also offer mass production services.