Interference Nanopatterning System
Fabricate Your Dreams
OUR NANOPATTERNING SYSTEMS
VIL Series Automatic Step-and-Repeat Interference Nanopatterning System
Our VIL series is a fully automatic step-and-repeat nanopatterning system. It allows to pattern different nanostructures on the same substrate with independently set periodicity, lattice, and feature sizes. The system is perfect for producing devices with different nano-scale features and patterning regions, such as AR displays.
HIL Series Wafer-Scale Nanopatterning System
Our HIL series is a powerful nanopatterning system which can produce sub-50-nm periodic nanostructures on a large area within minutes with one single exposure. It is ideal for high-quality wafer-scale nanoimprint masters fabrication and nanostructured device prototyping.
InterLitho invented the world's first two-beam interference nanopatterning system which provides turn-key solutions for large-area, high-throughput, and versatile nanopatterning.
Our innovative and pioneering interference nanopatterning systems allow fast and user-friendly fabrication of periodic nanostructures down to sub-50 nm sizes on wafer-scale area. We have different models designed for a wide range of patterning needs, from automatic step-and-repeat patterning equipment, one-shot whole-wafer patterning equipment, to economic educational tools. Customizable configurations and optional upgrade modules are available for enhanced patterning uniformity and integration with contact UV photolithography.
InterLitho invented the world's first two-beam interference nanopatterning system which provides turn-key solutions for large-area, high-throughput, and versatile nanopatterning.
To learn more about our technologies, please click