Nanoimprint Masters and Ultrafine Metal Stencil Masks
A Master In Nanoimprint Masters
InterLitho team has accumulated more than 20 years of profound understanding and extensive track records on nanoimprint technology, originated from Princeton University and further developed at the University of Hong Kong. We offer standard and customized wafer-scale nanoimprint masters with various 1D and 2D geometries and dimensions. These masters are created by our interference nanopatterning platforms as well as electron beam writers, direct laser writers etc.
Using our innovative fabrication processes, we also provide unique ultrathin and ultrafine stencil metal masks with sub-micron features. These unique masks are particularly useful for new materials and device R&D that requires chemical-free patterning, etching, and deposition processes.
Standard Nanostructured Samples and Nanoimprint Masters
With decades-long history of micro- and nanofabrication, InterLitho offers standard nanostructured samples on Si/SiO2 substrates, which offers a low-cost entry to nanotechnology for industrial and academic customers.
The nanostructured samples can be used as nanoimprint masters for nanopatterning as well as textured substrates for fundamental scientific research in optics, photonics, fluidics, and materials science etc. Nanoimprint masters with a wide range of periods, dimensions, and lattices are available. The corresponding morphological SEM images will be provided upon request.
Replicated Working Templates
Directly using the master nanoimprint molds in the production process is usually avoided due to risks of particle contamination, material residue, and mold breakage, which in turn will lead to increased defects in the imprinted structure. Using Replicated Working Templates copied from the master molds can extend the service life of the master molds, reduce production costs, and ensure the quality of the target structure. The materials commonly used to replicate working templates are usually UV-curable materials with good flow to ensure the authenticity of the replicated structures.
InterLitho offers replicated working templates with good performance as an alternative cost-effective solution to the original master molds.
Ultrathin and Ultrafine Metal Masks
Fine metal masks (FMMs) are thin metal sheets with tiny openings that are mainly used in microfabrication where conventional deposition and lift-off are unacceptable. Combined with vacuum evaporation or solution processes, FMMs are generally adopted in the deposition of organic materials that are used in organic light-emitting diode (OLED) displays of smartphones and wearable devices.
With the ultra-high-definition (UHD) required in the display, fabricating large-area FMMs with through-holes in nanoscale becomes necessary. To ensure the pattern completeness, the thickness of the FMMS should decrease with the size of the nanoholes to ensure a small taper angle for deposition, which is very challenging.
To address the above issues, InterLitho has developed ultrathin FMMs with feature sizes down to 500 nm. The ultrathin FMMs are flexible, reusable, and compatible with processes such as contact photolithography, dry etching, and deposition. Our ultrathin FMMs are ideal for research and prototyping purposes in new devices and materials.
Customized Nanoimprint Masters
InterLitho offers customized nanoimprint masters according to customers’ requirements. Our interference-patterned customized masters carry nanostructures of precise dimensions (< 2% periodicity error and < 5% feature size variation) over 3-inch or larger wafers at users’ choices. In addition to interference patterning, we also use other techniques such as electron beam lithography and direct laser writing to meet customers’ needs for master patterns, feature sizes, costs, and delivery time. Characterization reports will be available before shipping.